Now showing items 1-3 of 3

    • Cho, Sangho; Sun, Guorong; Wooley, Karen L.; Thackeray, James W.; Trefonas III, Peter (United States. Patent and Trademark Office; Texas A&M University. Libraries, 2016-08-02)
      Disclosed herein is a photoresist composition comprising a graft block copolymer; a solvent and a photoacid generator; where the graft block copolymer comprises a first block polymer; the first block polymer comprising a ...
    • Cho, Sangho; Sun, Guorong; Wooley, Karen L.; Thackeray, James W.; Trefonas III, Peter (United States. Patent and Trademark Office; Texas A&M University. Libraries, 2016-09-20)
      Disclosed herein is a graft block copolymer comprising a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing ...
    • Cho, Sangho; Sun, Guorong; Wooley, Karen L.; Thackeray, James W.; Trefonas, Peter III (United States. Patent and Trademark Office; Texas A&M University. Libraries, 2018-09-18)
      Disclosed herein is a graft block copolymer comprising a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing ...